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High-temperature Firing Pastes

CuNi resistive pastes for chip resistors

  • CuNi resistive pastes for chip resistorsサムネイル1
  • CuNi resistive pastes for chip resistorsサムネイル1

Our CuNi resistive paste for chip resistors can be used for low-resistance chip resistors for current detection, which is one of the automotive components. This paste does not cause instability in resistance values even when fired in a nitrogen atmosphere.
We can develop pastes to meet your requirements, such as adjusting the resistance value and TCR. We also print pastes on substrates.

Product Details

Features

    • It has high reliability against oxidation, which is a concern with copper-based materials.
    • It is also suitable for countermeasures against sulfidation and ion migration.
    • The resistance range is 10mΩ to 3.0Ω, making it ideal for current detection and power management chip resistors.
    • It is a base metal material and is ideal as an alternative to silver-palladium resistors, which are expensive and have a high risk of price fluctuation.
    • With a low TCR of ±50ppm/K and good control, it also meets the quality requirements for chip resistors of ±100ppm.
    • It does not contain environmentally hazardous substances such as Pb.

Structure

Example of use on Al₂O₃ substrate

  • (1) Al₂O₃ substrate
    (2) Copper electrode
    (3) CuNi resistive pastes for chip resistor
    (4) Overcoat glass

Application Example

    • Chip resistors for current detection
    • Chip resistors for power supply management
    • Ceramic heaters
    • Ceramic circuit substrate with resistive element

Specification

CuNi resistive pastes for resistors

Series Type Sheet resistance
(mΩ/□ @20μmt)
Resistance temperature coefficient(ppm/°C) Viscosity
(Pa・s)
Fired Thickness*²(μm) Coverage(cm²/g) Recommended firing condition
HTCR*¹ CTCR*¹
DH CNR01DH 10 +500±50 +500±50 30~50 18~20 55 900 °C 10min, In N₂
CNR03DH 30 -100±50 -80±50 30~50 18~20 55 900 °C 10min, In N₂
D CNR10D 100 -90±50 -70±50 30~50 20~25 68 900 °C 10min, In N₂
CNR50D 500 -60±50 -30±50 30~50 20~25 76 900 °C 10min, In N₂
CN1R5D 1,500 -40±50 -10±50 30~50 20~25 80 900 °C 10min, In N₂
CN3R0D 4,000 -10±50 +30±50 30~50 20~25 82 900 °C 10min, In N₂

Substrate: Al₂O₃, Electrode: Cu, Coating method: Screen printing, Storage condition: Refrigerated
*¹ HTCR:25℃~155℃, CTCR:-55℃~25℃
*² When using standard screen plate, mesh wire diameter: #250-φ30μm, calendar processing, emulsion thickness: 30μm
The resistance value can be adjusted by blending the DH series and D series.

Copper paste for electrodes

Type Resistivity(μΩ・cm) Viscosity(Pa・s) Fired Thickness*³(μm) Coverage(cm²/g) Recommended firing condition
DC019(Surface) ≦ 4 75±25 Ca. 13 85 900 °C 10min, In N₂
DC019U(Back) ≦ 4 75±25 Ca. 7 150 900 °C 10min, In N₂

Substrate: Al₂O₃, Coating method: Screen printing, Storage condition: Refrigerated
*³ When using standard screen plate
(DC019) Mesh wire diameter: #250-φ30μm, emulsion thickness: 10μm
(DC019U) Mesh wire diameter: #400-φ19μm, emulsion thickness: 10μm

Glass paste for overcoat

Type Color Viscosity (Pa・s) Fired Thickness*⁴(μm) Coverage(cm²/g) insulation(Ω) Acid resistance*⁵ Recommended firing condition
OCG12 Grayish white transparent 60±30 Ca. 13 250 8.0×1011 <3.0 850-900 °C 10min, In N₂

Substrate: Al₂O₃, Coating method: Screen printing, Storage condition: Refrigerated
*⁴ When using standard screen plate, mesh wire diameter: #400-φ19μm, emulsion thickness: 30μm
*⁵ Evaluation method: % weight loss after 1 hour immersion in 0.5wt% sulfuric acid

Caution

Please check the Material Safety Data Sheet (SDS) for each product.

Remarks

  • If you do not have a replacement nitrogen furnace, we can fire it on your behalf.
  • These results are based on the use of our copper paste for the electrode and our glass paste for the protective film.

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